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300 mm Large Area Wire Grid Polarizers with 50 nm Half-Pitch by ArF Immersion Lithography
The large area wire grid polarizers (LA-WGPs) with 50 nm half-pitch were fabricated using ArF immersion lithography overcoming the limit of the shot field size. To realize the 50 nm line and space patterns on a 300 mm wafer, a zero-distance stitching process that connects the shot fields is suggeste...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8839611/ https://www.ncbi.nlm.nih.gov/pubmed/35159824 http://dx.doi.org/10.3390/nano12030481 |