Study of Cryogenic Unmasked Etching of “Black Silicon” with Ar Gas Additives

[Image: see text] The influence of Ar gas additives on ≪black silicon≫ formation is shown in this work. The way to achieve the conical shape of Si texture using low Ar dilution is demonstrated. Also, a possibility of silicon nanowire width reduction keeping a high density of array is shown. No damag...

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Detalles Bibliográficos
Autores principales: Vyacheslavova, Ekaterina A., Morozov, Ivan A., Kudryashov, Dmitri A., Uvarov, Alexander V., Baranov, Artem I., Maksimova, Alina A., Abolmasov, Sergey N., Gudovskikh, Alexander S.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8867487/
https://www.ncbi.nlm.nih.gov/pubmed/35224366
http://dx.doi.org/10.1021/acsomega.1c06435

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8867487/
https://www.ncbi.nlm.nih.gov/pubmed/35224366
http://dx.doi.org/10.1021/acsomega.1c06435

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