Cargando…
Study of Cryogenic Unmasked Etching of “Black Silicon” with Ar Gas Additives
[Image: see text] The influence of Ar gas additives on ≪black silicon≫ formation is shown in this work. The way to achieve the conical shape of Si texture using low Ar dilution is demonstrated. Also, a possibility of silicon nanowire width reduction keeping a high density of array is shown. No damag...
| Autores principales: | , , , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2022
|
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8867487/ https://www.ncbi.nlm.nih.gov/pubmed/35224366 http://dx.doi.org/10.1021/acsomega.1c06435 |