An Endpoint Detection System for Ion Beam Etching Using Optical Emission Spectroscopy

An ion beam etching system with etching endpoint detection (EPD) capability based on optical emission spectroscopy (OES) was conceived, built, and tested. An expansion chamber was added on the right side of the etching chamber to fix the optical detector for in-situ detecting. In this system, the op...

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Detalles Bibliográficos
Autores principales: Zhang, Junjie, Luo, Jiahui, Zou, Xudong, Chen, Jiamin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8877325/
https://www.ncbi.nlm.nih.gov/pubmed/35208383
http://dx.doi.org/10.3390/mi13020259

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8877325/
https://www.ncbi.nlm.nih.gov/pubmed/35208383
http://dx.doi.org/10.3390/mi13020259

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