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An Endpoint Detection System for Ion Beam Etching Using Optical Emission Spectroscopy
An ion beam etching system with etching endpoint detection (EPD) capability based on optical emission spectroscopy (OES) was conceived, built, and tested. An expansion chamber was added on the right side of the etching chamber to fix the optical detector for in-situ detecting. In this system, the op...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8877325/ https://www.ncbi.nlm.nih.gov/pubmed/35208383 http://dx.doi.org/10.3390/mi13020259 |