Prediction of Surface Roughness as a Function of Temperature for SiO(2) Thin-Film in PECVD Process

An analytical model to predict the surface roughness for the plasma-enhanced chemical vapor deposition (PECVD) process over a large range of temperature values is still nonexistent. By using an existing prediction model, the surface roughness can directly be calculated instead of repeating the exper...

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Detalles Bibliográficos
Autores principales: Amirzada, Muhammad Rizwan, Khan, Yousuf, Ehsan, Muhammad Khurram, Rehman, Atiq Ur, Jamali, Abdul Aleem, Khatri, Abdul Rafay
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8877521/
https://www.ncbi.nlm.nih.gov/pubmed/35208438
http://dx.doi.org/10.3390/mi13020314

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8877521/
https://www.ncbi.nlm.nih.gov/pubmed/35208438
http://dx.doi.org/10.3390/mi13020314

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