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Prediction of Surface Roughness as a Function of Temperature for SiO(2) Thin-Film in PECVD Process
An analytical model to predict the surface roughness for the plasma-enhanced chemical vapor deposition (PECVD) process over a large range of temperature values is still nonexistent. By using an existing prediction model, the surface roughness can directly be calculated instead of repeating the exper...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8877521/ https://www.ncbi.nlm.nih.gov/pubmed/35208438 http://dx.doi.org/10.3390/mi13020314 |