Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects

The atomic layer technique is generating a lot of excitement and study due to its profound physics and enormous potential in device fabrication. This article reviews current developments in atomic layer technology for spintronics, including atomic layer deposition (ALD) and atomic layer etching (ALE...

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Detalles Bibliográficos
Autores principales: Tsai, Yuanlu, Li, Zhiteng, Hu, Shaojie
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8880290/
https://www.ncbi.nlm.nih.gov/pubmed/35214988
http://dx.doi.org/10.3390/nano12040661

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8880290/
https://www.ncbi.nlm.nih.gov/pubmed/35214988
http://dx.doi.org/10.3390/nano12040661

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