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Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure

In this study, bismuth trioxide (Bi(2)O(3)) membranes in an electrolyte–insulator–semiconductor (EIS) structure were fabricated with pH sensing capability. To optimize the sensing performance, the membranes were treated with two types of plasma—NH(3) and N(2)O. To investigate the material property i...

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Autores principales: Kao, Chyuan-Haur, Chen, Kuan-Lin, Chiu, Yi-Shiang, Hao, Lin Sang, Chen, Shih-Ming, Li, Ming-Hsien, Lee, Ming-Ling, Chen, Hsiang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8880718/
https://www.ncbi.nlm.nih.gov/pubmed/35207109
http://dx.doi.org/10.3390/membranes12020188
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author Kao, Chyuan-Haur
Chen, Kuan-Lin
Chiu, Yi-Shiang
Hao, Lin Sang
Chen, Shih-Ming
Li, Ming-Hsien
Lee, Ming-Ling
Chen, Hsiang
author_facet Kao, Chyuan-Haur
Chen, Kuan-Lin
Chiu, Yi-Shiang
Hao, Lin Sang
Chen, Shih-Ming
Li, Ming-Hsien
Lee, Ming-Ling
Chen, Hsiang
author_sort Kao, Chyuan-Haur
collection PubMed
description In this study, bismuth trioxide (Bi(2)O(3)) membranes in an electrolyte–insulator–semiconductor (EIS) structure were fabricated with pH sensing capability. To optimize the sensing performance, the membranes were treated with two types of plasma—NH(3) and N(2)O. To investigate the material property improvements, multiple material characterizations were conducted. Material analysis results indicate that plasma treatments with appropriate time could enhance the crystallization, remove the silicate and facilitate crystallizations. Owing to the material optimizations, the pH sensing capability could be greatly boosted. NH(3) or N(2)O plasma treated-Bi(2)O(3) membranes could reach the pH sensitivity around 60 mV/pH and show promise for future biomedical applications.
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spelling pubmed-88807182022-02-26 Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure Kao, Chyuan-Haur Chen, Kuan-Lin Chiu, Yi-Shiang Hao, Lin Sang Chen, Shih-Ming Li, Ming-Hsien Lee, Ming-Ling Chen, Hsiang Membranes (Basel) Article In this study, bismuth trioxide (Bi(2)O(3)) membranes in an electrolyte–insulator–semiconductor (EIS) structure were fabricated with pH sensing capability. To optimize the sensing performance, the membranes were treated with two types of plasma—NH(3) and N(2)O. To investigate the material property improvements, multiple material characterizations were conducted. Material analysis results indicate that plasma treatments with appropriate time could enhance the crystallization, remove the silicate and facilitate crystallizations. Owing to the material optimizations, the pH sensing capability could be greatly boosted. NH(3) or N(2)O plasma treated-Bi(2)O(3) membranes could reach the pH sensitivity around 60 mV/pH and show promise for future biomedical applications. MDPI 2022-02-05 /pmc/articles/PMC8880718/ /pubmed/35207109 http://dx.doi.org/10.3390/membranes12020188 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Kao, Chyuan-Haur
Chen, Kuan-Lin
Chiu, Yi-Shiang
Hao, Lin Sang
Chen, Shih-Ming
Li, Ming-Hsien
Lee, Ming-Ling
Chen, Hsiang
Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
title Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
title_full Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
title_fullStr Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
title_full_unstemmed Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
title_short Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
title_sort comparison of nh(3) and n(2)o plasma treatments on bi(2)o(3) sensing membranes applied in an electrolyte–insulator–semiconductor structure
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8880718/
https://www.ncbi.nlm.nih.gov/pubmed/35207109
http://dx.doi.org/10.3390/membranes12020188
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