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Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
In this study, bismuth trioxide (Bi(2)O(3)) membranes in an electrolyte–insulator–semiconductor (EIS) structure were fabricated with pH sensing capability. To optimize the sensing performance, the membranes were treated with two types of plasma—NH(3) and N(2)O. To investigate the material property i...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8880718/ https://www.ncbi.nlm.nih.gov/pubmed/35207109 http://dx.doi.org/10.3390/membranes12020188 |
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author | Kao, Chyuan-Haur Chen, Kuan-Lin Chiu, Yi-Shiang Hao, Lin Sang Chen, Shih-Ming Li, Ming-Hsien Lee, Ming-Ling Chen, Hsiang |
author_facet | Kao, Chyuan-Haur Chen, Kuan-Lin Chiu, Yi-Shiang Hao, Lin Sang Chen, Shih-Ming Li, Ming-Hsien Lee, Ming-Ling Chen, Hsiang |
author_sort | Kao, Chyuan-Haur |
collection | PubMed |
description | In this study, bismuth trioxide (Bi(2)O(3)) membranes in an electrolyte–insulator–semiconductor (EIS) structure were fabricated with pH sensing capability. To optimize the sensing performance, the membranes were treated with two types of plasma—NH(3) and N(2)O. To investigate the material property improvements, multiple material characterizations were conducted. Material analysis results indicate that plasma treatments with appropriate time could enhance the crystallization, remove the silicate and facilitate crystallizations. Owing to the material optimizations, the pH sensing capability could be greatly boosted. NH(3) or N(2)O plasma treated-Bi(2)O(3) membranes could reach the pH sensitivity around 60 mV/pH and show promise for future biomedical applications. |
format | Online Article Text |
id | pubmed-8880718 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-88807182022-02-26 Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure Kao, Chyuan-Haur Chen, Kuan-Lin Chiu, Yi-Shiang Hao, Lin Sang Chen, Shih-Ming Li, Ming-Hsien Lee, Ming-Ling Chen, Hsiang Membranes (Basel) Article In this study, bismuth trioxide (Bi(2)O(3)) membranes in an electrolyte–insulator–semiconductor (EIS) structure were fabricated with pH sensing capability. To optimize the sensing performance, the membranes were treated with two types of plasma—NH(3) and N(2)O. To investigate the material property improvements, multiple material characterizations were conducted. Material analysis results indicate that plasma treatments with appropriate time could enhance the crystallization, remove the silicate and facilitate crystallizations. Owing to the material optimizations, the pH sensing capability could be greatly boosted. NH(3) or N(2)O plasma treated-Bi(2)O(3) membranes could reach the pH sensitivity around 60 mV/pH and show promise for future biomedical applications. MDPI 2022-02-05 /pmc/articles/PMC8880718/ /pubmed/35207109 http://dx.doi.org/10.3390/membranes12020188 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Kao, Chyuan-Haur Chen, Kuan-Lin Chiu, Yi-Shiang Hao, Lin Sang Chen, Shih-Ming Li, Ming-Hsien Lee, Ming-Ling Chen, Hsiang Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure |
title | Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure |
title_full | Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure |
title_fullStr | Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure |
title_full_unstemmed | Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure |
title_short | Comparison of NH(3) and N(2)O Plasma Treatments on Bi(2)O(3) Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure |
title_sort | comparison of nh(3) and n(2)o plasma treatments on bi(2)o(3) sensing membranes applied in an electrolyte–insulator–semiconductor structure |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8880718/ https://www.ncbi.nlm.nih.gov/pubmed/35207109 http://dx.doi.org/10.3390/membranes12020188 |
work_keys_str_mv | AT kaochyuanhaur comparisonofnh3andn2oplasmatreatmentsonbi2o3sensingmembranesappliedinanelectrolyteinsulatorsemiconductorstructure AT chenkuanlin comparisonofnh3andn2oplasmatreatmentsonbi2o3sensingmembranesappliedinanelectrolyteinsulatorsemiconductorstructure AT chiuyishiang comparisonofnh3andn2oplasmatreatmentsonbi2o3sensingmembranesappliedinanelectrolyteinsulatorsemiconductorstructure AT haolinsang comparisonofnh3andn2oplasmatreatmentsonbi2o3sensingmembranesappliedinanelectrolyteinsulatorsemiconductorstructure AT chenshihming comparisonofnh3andn2oplasmatreatmentsonbi2o3sensingmembranesappliedinanelectrolyteinsulatorsemiconductorstructure AT liminghsien comparisonofnh3andn2oplasmatreatmentsonbi2o3sensingmembranesappliedinanelectrolyteinsulatorsemiconductorstructure AT leemingling comparisonofnh3andn2oplasmatreatmentsonbi2o3sensingmembranesappliedinanelectrolyteinsulatorsemiconductorstructure AT chenhsiang comparisonofnh3andn2oplasmatreatmentsonbi2o3sensingmembranesappliedinanelectrolyteinsulatorsemiconductorstructure |