Recent Advances in Theoretical Development of Thermal Atomic Layer Deposition: A Review

Atomic layer deposition (ALD) is a vapor-phase deposition technique that has attracted increasing attention from both experimentalists and theoreticians in the last few decades. ALD is well-known to produce conformal, uniform, and pinhole-free thin films across the surface of substrates. Due to thes...

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Detalles Bibliográficos
Autores principales: Shahmohammadi, Mina, Mukherjee, Rajib, Sukotjo, Cortino, Diwekar, Urmila M., Takoudis, Christos G.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8912810/
https://www.ncbi.nlm.nih.gov/pubmed/35269316
http://dx.doi.org/10.3390/nano12050831

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8912810/
https://www.ncbi.nlm.nih.gov/pubmed/35269316
http://dx.doi.org/10.3390/nano12050831

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