Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors

[Image: see text] Implementation of vapor/phase dosing of small molecule inhibitors (SMIs) in advanced atomic layer deposition (ALD) cycles is currently being considered for bottom-up fabrication by area-selective ALD. When SMIs are used, it can be challenging to completely block precursor adsorptio...

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Detalles Bibliográficos
Autores principales: Merkx, Marc J. M., Angelidis, Athanasios, Mameli, Alfredo, Li, Jun, Lemaire, Paul C., Sharma, Kashish, Hausmann, Dennis M., Kessels, Wilhelmus M. M., Sandoval, Tania E., Mackus, Adriaan J. M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8935369/
https://www.ncbi.nlm.nih.gov/pubmed/35330759
http://dx.doi.org/10.1021/acs.jpcc.1c10816

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8935369/
https://www.ncbi.nlm.nih.gov/pubmed/35330759
http://dx.doi.org/10.1021/acs.jpcc.1c10816

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