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Investigation on the Thermal Characteristics of Enhancement-Mode p-GaN HEMT Device on Si Substrate Using Thermoreflectance Microscopy
In this paper, thermoreflectance microscopy was used to measure the high spatial resolution temperature distribution of the p-GaN HEMT under high power density. The maximum temperature along the GaN channel was located at the drain-side gate edge region. It was found that the thermal resistance (R(t...
Autores principales: | Wang, Hongyue, Yuan, Chao, Xin, Yajie, Shi, Yijun, Zhong, Yaozong, Huang, Yun, Lu, Guoguang |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8952125/ https://www.ncbi.nlm.nih.gov/pubmed/35334758 http://dx.doi.org/10.3390/mi13030466 |
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