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Electrical Properties of Aluminum Nitride Thick Films Magnetron Sputtered on Aluminum Substrates
The realization of a c-axis oriented aluminum nitride thick film on aluminum substrates is a promising step in the development of transducers for applications with a working temperature up to about 600 °C. The present paper deals with the realization of AlN thick films by means of reactive magnetron...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8952570/ https://www.ncbi.nlm.nih.gov/pubmed/35329541 http://dx.doi.org/10.3390/ma15062090 |