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Electrical Properties of Aluminum Nitride Thick Films Magnetron Sputtered on Aluminum Substrates

The realization of a c-axis oriented aluminum nitride thick film on aluminum substrates is a promising step in the development of transducers for applications with a working temperature up to about 600 °C. The present paper deals with the realization of AlN thick films by means of reactive magnetron...

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Detalles Bibliográficos
Autores principales:	Desideri, Daniele, Bernardo, Enrico, Corso, Alain Jody, Moro, Federico, Pelizzo, Maria Guglielmina
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2022
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8952570/ https://www.ncbi.nlm.nih.gov/pubmed/35329541 http://dx.doi.org/10.3390/ma15062090

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