Surface Transformation of Spin-on-Carbon Film via Forming Carbon Iron Complex for Remarkably Enhanced Polishing Rate

To scale down semiconductor devices to a size less than the design rule of 10 nm, lithography using a carbon polymer hard-mask was applied, e.g., spin-on-carbon (SOC) film. Spin coating of the SOC film produces a high surface topography induced by pattern density, requiring chemical–mechanical plana...

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Detalles Bibliográficos
Autores principales: Lee, Jun-Myeong, Lee, Jong-Chan, Kim, Seong-In, Lee, Seung-Jae, Bae, Jae-Yung, Park, Jin-Hyung, Park, Jea-Gun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8953943/
https://www.ncbi.nlm.nih.gov/pubmed/35335782
http://dx.doi.org/10.3390/nano12060969

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8953943/
https://www.ncbi.nlm.nih.gov/pubmed/35335782
http://dx.doi.org/10.3390/nano12060969

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