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Study of high–low KPFM on a pn-patterned Si surface

Comparative measurements between frequency modulation Kelvin probe force microscopy (FM-KPFM) using low frequency bias voltage and heterodyne FM-KPFM using high frequency bias voltage were performed on the surface potential measurement. A silicon substrate patterned with p- and n-type impurities was...

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Detalles Bibliográficos
Autores principales: Izumi, Ryo, Li, Yan Jun, Naitoh, Yoshitaka, Sugawara, Yasuhiro
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Oxford University Press 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8973402/
https://www.ncbi.nlm.nih.gov/pubmed/35018450
http://dx.doi.org/10.1093/jmicro/dfab055