Superior nanopatterns via adjustable nanoimprint lithography on aluminum oxide in high-K thin films with ultraviolet curable polymer

The present study substantiate that ultraviolet-nanoimprint lithography (UV-NIL) can be used to transfer a one-dimensional nano-pattern onto a high-k thin film of aluminum oxide mixed with a UV photocuring agent. Polydimethylsiloxane (PDMS) molds fabricated on silicon wafers were made using deep ult...

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Detalles Bibliográficos
Autores principales: Oh, Jin Young, Kim, Eun-Mi, Heo, Gi-Seok, Kim, Dong Hyun, Lee, DongWook, Jeong, Hae-Chang, Seo, Dae-Shik
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2021
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8978656/
https://www.ncbi.nlm.nih.gov/pubmed/35424521
http://dx.doi.org/10.1039/d1ra08425a

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8978656/
https://www.ncbi.nlm.nih.gov/pubmed/35424521
http://dx.doi.org/10.1039/d1ra08425a

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