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Superior nanopatterns via adjustable nanoimprint lithography on aluminum oxide in high-K thin films with ultraviolet curable polymer
The present study substantiate that ultraviolet-nanoimprint lithography (UV-NIL) can be used to transfer a one-dimensional nano-pattern onto a high-k thin film of aluminum oxide mixed with a UV photocuring agent. Polydimethylsiloxane (PDMS) molds fabricated on silicon wafers were made using deep ult...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8978656/ https://www.ncbi.nlm.nih.gov/pubmed/35424521 http://dx.doi.org/10.1039/d1ra08425a |