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Selected properties of Al(x)Zn(y)O thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target
Al(x)Zn(y)O thin films were obtained by reactive pulsed magnetron sputtering. A two-element Zn/Al planar target was used as source material prepared in the form of a Zn disc (100 mm diameter) with Al rings pressed into its surface. The sputtering processes were carried out in a mixture of argon and...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8978919/ https://www.ncbi.nlm.nih.gov/pubmed/35425692 http://dx.doi.org/10.3762/bjnano.13.29 |