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Selected properties of Al(x)Zn(y)O thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target

Al(x)Zn(y)O thin films were obtained by reactive pulsed magnetron sputtering. A two-element Zn/Al planar target was used as source material prepared in the form of a Zn disc (100 mm diameter) with Al rings pressed into its surface. The sputtering processes were carried out in a mixture of argon and...

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Detalles Bibliográficos
Autores principales: Posadowski, Witold, Wiatrowski, Artur, Domaradzki, Jarosław, Mazur, Michał
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8978919/
https://www.ncbi.nlm.nih.gov/pubmed/35425692
http://dx.doi.org/10.3762/bjnano.13.29

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