Investigation of correlative parameters to evaluate EUV lithographic performance of PMMA

Investigations to evaluate the extreme ultraviolet (EUV) lithographic performance of 160 nm thick poly(methyl methacrylate) with 13.5 nm wavelength EUV light were performed using a synchrotron radiation source at Pohang Light Source-II (PLS-II). The single system enabled the determination of the sen...

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Detalles Bibliográficos
Autores principales: Kim, Kanghyun, Lee, Jong-Won, Park, Byeong-Gyu, Oh, Hyun-Taek, Ku, Yejin, Lee, Jin-Kyun, Lim, Geunbae, Lee, Sangsul
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2022
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8979033/
https://www.ncbi.nlm.nih.gov/pubmed/35425284
http://dx.doi.org/10.1039/d1ra07291a

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8979033/
https://www.ncbi.nlm.nih.gov/pubmed/35425284
http://dx.doi.org/10.1039/d1ra07291a

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