Cargando…

Investigation of correlative parameters to evaluate EUV lithographic performance of PMMA

Investigations to evaluate the extreme ultraviolet (EUV) lithographic performance of 160 nm thick poly(methyl methacrylate) with 13.5 nm wavelength EUV light were performed using a synchrotron radiation source at Pohang Light Source-II (PLS-II). The single system enabled the determination of the sen...

Descripción completa

Detalles Bibliográficos
Autores principales:	Kim, Kanghyun, Lee, Jong-Won, Park, Byeong-Gyu, Oh, Hyun-Taek, Ku, Yejin, Lee, Jin-Kyun, Lim, Geunbae, Lee, Sangsul
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	The Royal Society of Chemistry 2022
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8979033/ https://www.ncbi.nlm.nih.gov/pubmed/35425284 http://dx.doi.org/10.1039/d1ra07291a

Ejemplares similares

Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist
por: Kim, Jiho, et al.
Publicado: (2022)

Investigating the Degradation of EUV Transmittance of an EUV Pellicle Membrane
por: Wi, Seong Ju, et al.
Publicado: (2022)

Highly Fluorinated Barium Titanate Nanoparticle Dispersion for Fabrication of Lithographically Patterned Thin Films
por: Kim, Youngtae, et al.
Publicado: (2019)

Perfluoroalkylated alternating copolymer possessing solubility in fluorous liquids and imaging capabilities under high energy radiation
por: Oh, Hyun-Taek, et al.
Publicado: (2021)

EUV lithography
por: Bakshi, Vivek
Publicado: (2018)

The lithographers manual
Publicado: (1974)

Fabrication of Polymer Microstructures of Various Angles via Synchrotron X-Ray Lithography Using Simple Dimensional Transformation
por: Park, Kyungjin, et al.
Publicado: (2018)

Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography
por: Wi, Seong Ju, et al.
Publicado: (2022)

Berkeley Colloquium on EUV Astronomy
Publicado: (1989)

Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation
por: Park, Juhae, et al.
Publicado: (2019)

An Investigation of Polyoxometalate Hybrid Materials as Patternable Dielectrics and Lithographic Resists
por: Hardie, Brandon, et al.
Publicado: (2017)

Unveiling the Secrets of Escher’s Lithographs
por: Coltelli, Primo, et al.
Publicado: (2020)

Extreme wettability of nanostructured glass fabricated by non-lithographic, anisotropic etching
por: Yu, Eusun, et al.
Publicado: (2015)

Coherent Tabletop EUV Ptychography of Nanopatterns
por: Truong, Nguyen Xuan, et al.
Publicado: (2018)

In-Flight Performance of the ICON EUV Spectrograph
por: Korpela, Eric J., et al.
Publicado: (2023)

The EUV coronae of the young solar analogs 47 Cas and EK Dra: an EUVE spectroscopic and timing study of coronal heating
por: Audard, M, et al.
Publicado: (1998)

Physico-Chemical Surface Modifications of Polyetheretherketone (PEEK) Using Extreme Ultraviolet (EUV) Radiation and EUV-Induced Nitrogen Plasma
por: Czwartos, Joanna, et al.
Publicado: (2020)

A soft lithographic approach to fabricate InAs nanowire field-effect transistors
por: Lee, Sang Hwa, et al.
Publicado: (2018)

Parametric verification of one-way lithographic wicks
por: Zhou, Jijie, et al.
Publicado: (2009)

Funic Hæmorrhage during Labour (with 2 Lithographs)
por: Croom, J. Halliday
Publicado: (1882)

Inexpensive Graphene Oxide Heaters Lithographed by Laser
por: Romero, Francisco J., et al.
Publicado: (2019)

EUV, X-Ray, and Gamma ray Instrumentation for Astronomy
Publicado: (1999)

Special Issue “EUV and X-ray Wavefront Sensing”
por: Idir, Mourad, et al.
Publicado: (2022)

Neutral Composition Information in ICON EUV Dayglow Observations
por: Tuminello, Richard M., et al.
Publicado: (2022)

Non-lithographic nanofluidic channels with precisely controlled circular cross sections
por: Park, Yang-Seok, et al.
Publicado: (2018)

Reliable Diameter Control of Carbon Nanotube Nanobundles Using Withdrawal Velocity
por: Shin, Jung Hwal, et al.
Publicado: (2016)

Recent Progress on Microelectrodes in Neural Interfaces
por: Kim, Geon Hwee, et al.
Publicado: (2018)

The History of the Development of the Ovum of the Dog, with Fifteen Lithographic Plates
Publicado: (1847)

Clean-Room Lithographical Processes for the Fabrication of Graphene Biosensors
por: Cabral, Patrícia D., et al.
Publicado: (2020)

Shape Modulation of Plasmonic Nanostructures by Unconventional Lithographic Technique
por: Colombelli, Adriano, et al.
Publicado: (2022)

68th Symposium on Solar Gamma-, X-, and EUV Radiation
por: Kane, Sharad
Publicado: (1975)

The performance of transmission filters for EUV and soft X-ray astronomy
por: Bavdaz, M, et al.
Publicado: (1996)

Meeting on EUV, X-ray and Gamma-Ray Instrumentation for Astronomy
Publicado: (1997)

Implications from EUV observations for coronal heating of active stars
por: Audard, M, et al.
Publicado: (1999)

EUV, X-ray and $\gamma$-ray instrumentation for astronomy X
por: Kelley, R L, et al.
Publicado: (2000)

Resistless EUV lithography: Photon-induced oxide patterning on silicon
por: Tseng, Li-Ting, et al.
Publicado: (2023)

CMOS compatible 2T pixel for on-wafer in-situ EUV detection
por: Lin, Wei-Hwa, et al.
Publicado: (2023)

Coarse-Grained Modeling of EUV Patterning Process Reflecting Photochemical Reactions and Chain Conformations
por: Kim, Tae-Yi, et al.
Publicado: (2023)

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
por: Bowers, Carleen M., et al.
Publicado: (2011)

Non-Lithographic Silicon Micromachining Using Inkjet and Chemical Etching
por: Hoshian, Sasha, et al.
Publicado: (2016)

Cannot write session to /tmp/vufind_sessions/sess_hd97ger6fe7hh7b140fv1lar3f