Effect of pulse laser frequency on PLD growth of LuFeO(3) explained by kinetic simulations of in-situ diffracted intensities

Atomistic processes during pulsed-laser deposition (PLD) growth influence the physical properties of the resulting films. We investigated the PLD of epitaxial layers of hexagonal LuFeO[Formula: see text] by measuring the X-ray diffraction intensity in the quasiforbidden reflection 0003 in situ durin...

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Detalles Bibliográficos
Autores principales: Gabriel, Vít, Kocán, Pavel, Bauer, Sondes, Nergis, Berkin, Rodrigues, Adriana, Horák, Lukáš, Jin, Xiaowei, Schneider, Reinhard, Baumbach, Tilo, Holý, Václav
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8983772/
https://www.ncbi.nlm.nih.gov/pubmed/35383221
http://dx.doi.org/10.1038/s41598-022-09414-3

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8983772/
https://www.ncbi.nlm.nih.gov/pubmed/35383221
http://dx.doi.org/10.1038/s41598-022-09414-3

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