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Effect of pulse laser frequency on PLD growth of LuFeO(3) explained by kinetic simulations of in-situ diffracted intensities
Atomistic processes during pulsed-laser deposition (PLD) growth influence the physical properties of the resulting films. We investigated the PLD of epitaxial layers of hexagonal LuFeO[Formula: see text] by measuring the X-ray diffraction intensity in the quasiforbidden reflection 0003 in situ durin...
Autores principales: | Gabriel, Vít, Kocán, Pavel, Bauer, Sondes, Nergis, Berkin, Rodrigues, Adriana, Horák, Lukáš, Jin, Xiaowei, Schneider, Reinhard, Baumbach, Tilo, Holý, Václav |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8983772/ https://www.ncbi.nlm.nih.gov/pubmed/35383221 http://dx.doi.org/10.1038/s41598-022-09414-3 |
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