Cargando…
Optimization of Feedback FET with Asymmetric Source Drain Doping Profile
A feedback field-effect transistor (FBFET) is a novel device that uses a positive feedback mechanism. FBFET has a high on-/off ratio and is expected to realize ideal switching characteristics through steep changes from off-state to on-state. In this paper, we propose and optimize FBFET devices with...
Autores principales: | Lee, Inyoung, Park, Hyojin, Nguyen, Quan The, Kim, Garam, Cho, Seongjae, Cho, Ilhwan |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9030162/ https://www.ncbi.nlm.nih.gov/pubmed/35457814 http://dx.doi.org/10.3390/mi13040508 |
Ejemplares similares
-
Controlling Drain Side Tunneling Barrier Width in Electrically Doped PNPN Tunnel FET
por: Shan, Chan, et al.
Publicado: (2023) -
Asymmetric Drain Extension Dual-kk Trigate Underlap FinFET Based on RF/Analog Circuit
por: Han, Ke, et al.
Publicado: (2017) -
Improving ESD Protection Robustness Using SiGe Source/Drain Regions in Tunnel FET
por: Yang, Zhaonian, et al.
Publicado: (2018) -
Drain Current Model for Double Gate Tunnel-FETs with InAs/Si Heterojunction and Source-Pocket Architecture
por: Lu, Hongliang, et al.
Publicado: (2019) -
Low-Temperature (≤500 °C) Complementary Schottky Source/Drain FinFETs for 3D Sequential Integration
por: Mao, Shujuan, et al.
Publicado: (2022)