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Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography

A pellicle is a thin membrane structure that protects an extreme ultraviolet (EUV) mask from contamination during the exposure process. However, its limited transmittance induces unwanted heating owing to the absorption of EUV photons. The rupture of the EUV pellicle can be avoided by improving its...

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Detalles Bibliográficos
Autores principales: Wi, Seong Ju, Jang, Yong Ju, Kim, Haneul, Cho, Kyeongjae, Ahn, Jinho
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9031763/
https://www.ncbi.nlm.nih.gov/pubmed/35448337
http://dx.doi.org/10.3390/membranes12040367