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Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography
A pellicle is a thin membrane structure that protects an extreme ultraviolet (EUV) mask from contamination during the exposure process. However, its limited transmittance induces unwanted heating owing to the absorption of EUV photons. The rupture of the EUV pellicle can be avoided by improving its...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9031763/ https://www.ncbi.nlm.nih.gov/pubmed/35448337 http://dx.doi.org/10.3390/membranes12040367 |