Study of deposition parameters and growth kinetics of ZnO deposited by aerosol assisted chemical vapor deposition

Aerosol-assisted Chemical Vapor Deposition (AACVD) is a thermally activated CVD technique that uses micro-droplets as deposition precursors. An AACVD system with a custom-designed reaction chamber has been implemented to grow ZnO thin films using zinc chloride as a precursor. The present work aims t...

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Detalles Bibliográficos
Autores principales: Sánchez-Martín, Sergio, Olaizola, S. M., Castaño, E., Urionabarrenetxea, E., Mandayo, G. G., Ayerdi, I.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2021
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9033435/
https://www.ncbi.nlm.nih.gov/pubmed/35480902
http://dx.doi.org/10.1039/d1ra03251h

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9033435/
https://www.ncbi.nlm.nih.gov/pubmed/35480902
http://dx.doi.org/10.1039/d1ra03251h

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