Electron beam lithography for direct patterning of MoS(2) on PDMS substrates

Precise patterning of 2D materials into micro- and nanostructures presents a considerable challenge and many efforts are dedicated to the development of processes alternative to the standard lithography. In this work we show a fabrication technique based on direct electron beam lithography (EBL) on...

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Detalles Bibliográficos
Autores principales: Jumbert, Gil, Placidi, Marcel, Alzina, Francesc, Sotomayor Torres, Clivia M., Sledzinska, Marianna
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2021
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9033649/
https://www.ncbi.nlm.nih.gov/pubmed/35479206
http://dx.doi.org/10.1039/d1ra00885d

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9033649/
https://www.ncbi.nlm.nih.gov/pubmed/35479206
http://dx.doi.org/10.1039/d1ra00885d

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