Deposition of MoSe(2) flakes using cyclic selenides

The currently limited portfolio of volatile organoselenium compounds used for atomic layer deposition (ALD) has been extended by designing and preparing a series of four-, five- and six-membered cyclic silylselenides. Their fundamental properties were tailored by alternating the ring size, the numbe...

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Detalles Bibliográficos
Autores principales: Charvot, Jaroslav, Zazpe, Raul, Krumpolec, Richard, Rodriguez-Pereira, Jhonatan, Pavliňák, David, Pokorný, Daniel, Klikar, Milan, Jelínková, Veronika, Macak, Jan M., Bureš, Filip
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2021
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9034216/
https://www.ncbi.nlm.nih.gov/pubmed/35480798
http://dx.doi.org/10.1039/d0ra10239c

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9034216/
https://www.ncbi.nlm.nih.gov/pubmed/35480798
http://dx.doi.org/10.1039/d0ra10239c

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