Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone

Rhodium (Rh) and palladium (Pd) thin films have been fabricated using an atomic layer deposition (ALD) process using Rh(acac)(3) and Pd(hfac)(2) as the respective precursors and using short-pulse low-concentration ozone as the co-reactant. This method of fabrication does away with the need for combu...

Descripción completa

Detalles Bibliográficos
Autores principales: Zou, Yiming, Cheng, Chunyu, Guo, Yuanyuan, Ong, Amanda Jiamin, Goei, Ronn, Li, Shuzhou, Yoong Tok, Alfred Iing
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2021
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9034295/
https://www.ncbi.nlm.nih.gov/pubmed/35480446
http://dx.doi.org/10.1039/d1ra03942c

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9034295/
https://www.ncbi.nlm.nih.gov/pubmed/35480446
http://dx.doi.org/10.1039/d1ra03942c

Ejemplares similares