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Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone
Rhodium (Rh) and palladium (Pd) thin films have been fabricated using an atomic layer deposition (ALD) process using Rh(acac)(3) and Pd(hfac)(2) as the respective precursors and using short-pulse low-concentration ozone as the co-reactant. This method of fabrication does away with the need for combu...
Autores principales: | Zou, Yiming, Cheng, Chunyu, Guo, Yuanyuan, Ong, Amanda Jiamin, Goei, Ronn, Li, Shuzhou, Yoong Tok, Alfred Iing |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society of Chemistry
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9034295/ https://www.ncbi.nlm.nih.gov/pubmed/35480446 http://dx.doi.org/10.1039/d1ra03942c |
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