Correlative AFM and Scanning Microlens Microscopy for Time‐Efficient Multiscale Imaging

With the rapid evolution of microelectronics and nanofabrication technologies, the feature sizes of large‐scale integrated circuits continue to move toward the nanoscale. There is a strong need to improve the quality and efficiency of integrated circuit inspection, but it remains a great challenge t...

Descripción completa

Detalles Bibliográficos
Autores principales: Zhang, Tianyao, Yu, Haibo, Shi, Jialin, Wang, Xiaoduo, Luo, Hao, Lin, Daojing, Liu, Zhu, Su, Chanmin, Wang, Yuechao, Liu, Lianqing
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2022
Materias:
Research Articles
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9036010/
https://www.ncbi.nlm.nih.gov/pubmed/35224895
http://dx.doi.org/10.1002/advs.202103902

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9036010/
https://www.ncbi.nlm.nih.gov/pubmed/35224895
http://dx.doi.org/10.1002/advs.202103902

Ejemplares similares