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Correlative AFM and Scanning Microlens Microscopy for Time‐Efficient Multiscale Imaging
With the rapid evolution of microelectronics and nanofabrication technologies, the feature sizes of large‐scale integrated circuits continue to move toward the nanoscale. There is a strong need to improve the quality and efficiency of integrated circuit inspection, but it remains a great challenge t...
| Autores principales: | , , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
John Wiley and Sons Inc.
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9036010/ https://www.ncbi.nlm.nih.gov/pubmed/35224895 http://dx.doi.org/10.1002/advs.202103902 |