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General corrosion during metal-assisted etching of n-type silicon using different metal catalysts of silver, gold, and platinum

Metal-assisted etching is a promising technique for microfabrication of semiconductors. In this method, porous silicon (Si) can be produced with a very simple procedure, and various nanostructures can be designed by changing the catalyst patterns. The kind of metal catalysts is one of the key factor...

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Detalles Bibliográficos
Autores principales: Matsumoto, Ayumu, Son, Hikoyoshi, Eguchi, Makiho, Iwamoto, Keishi, Shimada, Yuki, Furukawa, Kyohei, Yae, Shinji
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9048163/
https://www.ncbi.nlm.nih.gov/pubmed/35492542
http://dx.doi.org/10.1039/c9ra08728a