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General corrosion during metal-assisted etching of n-type silicon using different metal catalysts of silver, gold, and platinum
Metal-assisted etching is a promising technique for microfabrication of semiconductors. In this method, porous silicon (Si) can be produced with a very simple procedure, and various nanostructures can be designed by changing the catalyst patterns. The kind of metal catalysts is one of the key factor...
Autores principales: | Matsumoto, Ayumu, Son, Hikoyoshi, Eguchi, Makiho, Iwamoto, Keishi, Shimada, Yuki, Furukawa, Kyohei, Yae, Shinji |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society of Chemistry
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9048163/ https://www.ncbi.nlm.nih.gov/pubmed/35492542 http://dx.doi.org/10.1039/c9ra08728a |
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