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Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments

Surface acoustic wave (SAW) devices based on piezoelectric thin-films such as ZnO and AlN are widely used in sensing, microfluidics and lab-on-a-chip applications. However, for many of these applications, the SAW devices will inevitably be used in acid or alkali harsh environments, which may cause t...

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Autores principales: Xiong, Shuo, Liu, Xudong, Zhou, Jian, Liu, Yi, Shen, Yiping, Yin, Xiaobo, Wu, Jianhui, Tao, Ran, Fu, Yongqing, Duan, Huigao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9054069/
https://www.ncbi.nlm.nih.gov/pubmed/35515426
http://dx.doi.org/10.1039/d0ra02448a
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author Xiong, Shuo
Liu, Xudong
Zhou, Jian
Liu, Yi
Shen, Yiping
Yin, Xiaobo
Wu, Jianhui
Tao, Ran
Fu, Yongqing
Duan, Huigao
author_facet Xiong, Shuo
Liu, Xudong
Zhou, Jian
Liu, Yi
Shen, Yiping
Yin, Xiaobo
Wu, Jianhui
Tao, Ran
Fu, Yongqing
Duan, Huigao
author_sort Xiong, Shuo
collection PubMed
description Surface acoustic wave (SAW) devices based on piezoelectric thin-films such as ZnO and AlN are widely used in sensing, microfluidics and lab-on-a-chip applications. However, for many of these applications, the SAW devices will inevitably be used in acid or alkali harsh environments, which may cause their early failures. In this work, we investigated the behavior and degradation mechanisms of thin film based SAW devices in acid and alkali harsh environments. Results show that under the acid and alkali attacks, chemical reaction and corrosion of ZnO devices are very fast (usually within 45 s). During the corrosion, the crystalline orientation of the ZnO film is not changed, but its grain defects are significantly increased and the grain sizes are decreased. The velocity of ZnO-based SAW devices is decreased due to the formation of porous structures induced by the chemical reactions. Whereas an AlN thin-film based SAW device does not perform well in acid–alkali conditions, it might be able to maintain a normal performance without obvious degradation for more than ten hours in acid or alkali solutions. This work could provide guidance for the applications of both ZnO or AlN-based SAW devices in acid/alkali harsh environments.
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spelling pubmed-90540692022-05-04 Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments Xiong, Shuo Liu, Xudong Zhou, Jian Liu, Yi Shen, Yiping Yin, Xiaobo Wu, Jianhui Tao, Ran Fu, Yongqing Duan, Huigao RSC Adv Chemistry Surface acoustic wave (SAW) devices based on piezoelectric thin-films such as ZnO and AlN are widely used in sensing, microfluidics and lab-on-a-chip applications. However, for many of these applications, the SAW devices will inevitably be used in acid or alkali harsh environments, which may cause their early failures. In this work, we investigated the behavior and degradation mechanisms of thin film based SAW devices in acid and alkali harsh environments. Results show that under the acid and alkali attacks, chemical reaction and corrosion of ZnO devices are very fast (usually within 45 s). During the corrosion, the crystalline orientation of the ZnO film is not changed, but its grain defects are significantly increased and the grain sizes are decreased. The velocity of ZnO-based SAW devices is decreased due to the formation of porous structures induced by the chemical reactions. Whereas an AlN thin-film based SAW device does not perform well in acid–alkali conditions, it might be able to maintain a normal performance without obvious degradation for more than ten hours in acid or alkali solutions. This work could provide guidance for the applications of both ZnO or AlN-based SAW devices in acid/alkali harsh environments. The Royal Society of Chemistry 2020-05-20 /pmc/articles/PMC9054069/ /pubmed/35515426 http://dx.doi.org/10.1039/d0ra02448a Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by-nc/3.0/
spellingShingle Chemistry
Xiong, Shuo
Liu, Xudong
Zhou, Jian
Liu, Yi
Shen, Yiping
Yin, Xiaobo
Wu, Jianhui
Tao, Ran
Fu, Yongqing
Duan, Huigao
Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments
title Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments
title_full Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments
title_fullStr Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments
title_full_unstemmed Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments
title_short Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments
title_sort stability studies of zno and aln thin film acoustic wave devices in acid and alkali harsh environments
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9054069/
https://www.ncbi.nlm.nih.gov/pubmed/35515426
http://dx.doi.org/10.1039/d0ra02448a
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