Cargando…
High quality N-polar GaN films grown with varied V/III ratios by metal–organic vapor phase epitaxy
We studied the growths and characterizations of N-polar GaN films grown with constant and varied V/III ratios in high-temperature (HT) GaN growth on offcut c-plane sapphire substrates by metal–organic vapor phase epitaxy. It is found that growth with a constantly low V/III ratio resulted in a high c...
Autores principales: | Li, Chengguo, Zhang, Kang, Qiaoyu Zeng, Yin, Xuebing, Ge, Xiaoming, Wang, Junjun, Wang, Qiao, He, Chenguang, Zhao, Wei, Chen, Zhitao |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society of Chemistry
2020
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9058150/ https://www.ncbi.nlm.nih.gov/pubmed/35514894 http://dx.doi.org/10.1039/d0ra07856e |
Ejemplares similares
-
Investigation of cracks in GaN films grown by combined hydride and metal organic vapor-phase epitaxial method
por: Liu, Jianming, et al.
Publicado: (2011) -
Gallium hydride vapor phase epitaxy of GaN nanowires
por: Zervos, Matthew, et al.
Publicado: (2011) -
Study of InN epitaxial films and nanorods grown on GaN template by RF-MOMBE
por: Chen, Wei-Chun, et al.
Publicado: (2012) -
N-polar GaN Film Epitaxy on Sapphire Substrate without Intentional Nitridation
por: Su, Zhaole, et al.
Publicado: (2022) -
Infrared Reflectance Analysis of Epitaxial n-Type Doped GaN Layers Grown on Sapphire
por: Tsykaniuk, Bogdan I., et al.
Publicado: (2017)