A novel fabrication technique for high-aspect-ratio nanopillar arrays for SERS application

A novel technique is demonstrated for the fabrication of silicon nanopillar arrays with high aspect ratios. Our technique leverages on an “antenna effect” present on a chromium (Cr) hard mask during ion-coupled plasma (ICP) etching. Randomly distributed sharp tips around the Cr edge act as antennas...

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Detalles Bibliográficos
Autores principales: Duan, Tianli, Gu, Chenjie, Ang, Diing Shenp, Xu, Kang, Liu, Zhihong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2020
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9058654/
https://www.ncbi.nlm.nih.gov/pubmed/35516272
http://dx.doi.org/10.1039/d0ra09145f

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9058654/
https://www.ncbi.nlm.nih.gov/pubmed/35516272
http://dx.doi.org/10.1039/d0ra09145f

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