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A novel fabrication technique for high-aspect-ratio nanopillar arrays for SERS application
A novel technique is demonstrated for the fabrication of silicon nanopillar arrays with high aspect ratios. Our technique leverages on an “antenna effect” present on a chromium (Cr) hard mask during ion-coupled plasma (ICP) etching. Randomly distributed sharp tips around the Cr edge act as antennas...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9058654/ https://www.ncbi.nlm.nih.gov/pubmed/35516272 http://dx.doi.org/10.1039/d0ra09145f |