High-performance thin H:SiON OLED encapsulation layer deposited by PECVD at low temperature

Highly moisture permeation resistive and transparent single layer thin films for the encapsulation of hydrogenated silicon oxynitrides (H:SiON) were deposited by plasma-enhanced chemical vapor deposition (PECVD) using silane (SiH(4)), nitrous oxide (N(2)O), ammonia (NH(3)), and hydrogen (H(2)) at 10...

Descripción completa

Detalles Bibliográficos
Autores principales: Park, Kyoung Woo, Lee, Seunghee, Lee, Hyunkoo, Cho, Yong-Hwan, Park, Yong Cheon, Im, Sung Gap, Ko Park, Sang-Hee
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2018
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9059308/
https://www.ncbi.nlm.nih.gov/pubmed/35521588
http://dx.doi.org/10.1039/c8ra08449a

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9059308/
https://www.ncbi.nlm.nih.gov/pubmed/35521588
http://dx.doi.org/10.1039/c8ra08449a

Ejemplares similares