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High-performance thin H:SiON OLED encapsulation layer deposited by PECVD at low temperature

Highly moisture permeation resistive and transparent single layer thin films for the encapsulation of hydrogenated silicon oxynitrides (H:SiON) were deposited by plasma-enhanced chemical vapor deposition (PECVD) using silane (SiH(4)), nitrous oxide (N(2)O), ammonia (NH(3)), and hydrogen (H(2)) at 10...

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Detalles Bibliográficos
Autores principales:	Park, Kyoung Woo, Lee, Seunghee, Lee, Hyunkoo, Cho, Yong-Hwan, Park, Yong Cheon, Im, Sung Gap, Ko Park, Sang-Hee
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	The Royal Society of Chemistry 2018
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9059308/ https://www.ncbi.nlm.nih.gov/pubmed/35521588 http://dx.doi.org/10.1039/c8ra08449a

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