Super-resolution interference lithography enabled by non-equilibrium kinetics of photochromic monolayers

Highly parallelized optical super-resolution lithography techniques are key for realizing bulk volume nanopatterning in materials. The majority of demonstrated STED-inspired lithography schemes are serial writing techniques. Here we use a recently developed model spirothiopyran monolayer photoresist...

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Detalles Bibliográficos
Autores principales: Vijayamohanan, Harikrishnan, Kenath, Gopal S., Palermo, Edmund F., Ullal, Chaitanya K.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2019
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9071233/
https://www.ncbi.nlm.nih.gov/pubmed/35529644
http://dx.doi.org/10.1039/c9ra05864h

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9071233/
https://www.ncbi.nlm.nih.gov/pubmed/35529644
http://dx.doi.org/10.1039/c9ra05864h

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