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Super-resolution interference lithography enabled by non-equilibrium kinetics of photochromic monolayers
Highly parallelized optical super-resolution lithography techniques are key for realizing bulk volume nanopatterning in materials. The majority of demonstrated STED-inspired lithography schemes are serial writing techniques. Here we use a recently developed model spirothiopyran monolayer photoresist...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9071233/ https://www.ncbi.nlm.nih.gov/pubmed/35529644 http://dx.doi.org/10.1039/c9ra05864h |