Effect of Fe ion implantation on the thermoelectric properties and electronic structures of CoSb(3) thin films

In the present study, thin films of single-phase CoSb(3) were deposited onto Si(100) substrates via pulsed laser deposition (PLD) method using a polycrystalline target of CoSb(3). These films were implanted by 120 keV Fe-ions with three different fluences: 1 × 10(15), 2.5 × 10(15) and 5 × 10(15) ion...

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Detalles Bibliográficos
Autores principales: Masarrat, Anha, Bhogra, Anuradha, Meena, Ramcharan, Bala, Manju, Singh, Ranveer, Barwal, Vineet, Dong, Chung-Li, Chen, Chi-Liang, Som, T., Kumar, Ashish, Niazi, A., Asokan, K.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2019
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9074955/
https://www.ncbi.nlm.nih.gov/pubmed/35540568
http://dx.doi.org/10.1039/c9ra06873b

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9074955/
https://www.ncbi.nlm.nih.gov/pubmed/35540568
http://dx.doi.org/10.1039/c9ra06873b

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