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Mobility enhancement in heavily doped semiconductors via electron cloaking

Doping is central for solid-state devices from transistors to thermoelectric energy converters. The interaction between electrons and dopants plays a pivotal role in carrier transport. Conventional theory suggests that the Coulomb field of the ionized dopants limits the charge mobility at high carri...

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Autores principales: Zhou, Jiawei, Zhu, Hangtian, Song, Qichen, Ding, Zhiwei, Mao, Jun, Ren, Zhifeng, Chen, Gang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9076901/
https://www.ncbi.nlm.nih.gov/pubmed/35523766
http://dx.doi.org/10.1038/s41467-022-29958-2
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author Zhou, Jiawei
Zhu, Hangtian
Song, Qichen
Ding, Zhiwei
Mao, Jun
Ren, Zhifeng
Chen, Gang
author_facet Zhou, Jiawei
Zhu, Hangtian
Song, Qichen
Ding, Zhiwei
Mao, Jun
Ren, Zhifeng
Chen, Gang
author_sort Zhou, Jiawei
collection PubMed
description Doping is central for solid-state devices from transistors to thermoelectric energy converters. The interaction between electrons and dopants plays a pivotal role in carrier transport. Conventional theory suggests that the Coulomb field of the ionized dopants limits the charge mobility at high carrier densities, and that either the atomic details of the dopants are unimportant or the mobility can only be further degraded, while experimental results often show that dopant choice affects mobility. In practice, the selection of dopants is still mostly a trial-and-error process. Here we demonstrate, via first-principles simulation and comparison with experiments, that a large short-range perturbation created by selected dopants can in fact counteract the long-range Coulomb field, leading to electron transport that is nearly immune to the presence of dopants. Such “cloaking” of dopants leads to enhanced mobilities at high carrier concentrations close to the intrinsic electron–phonon scattering limit. We show that the ionic radius can be used to guide dopant selection in order to achieve such an electron-cloaking effect. Our finding provides guidance to the selection of dopants for solid-state conductors to achieve high mobility for electronic, photonic, and energy conversion applications.
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spelling pubmed-90769012022-05-08 Mobility enhancement in heavily doped semiconductors via electron cloaking Zhou, Jiawei Zhu, Hangtian Song, Qichen Ding, Zhiwei Mao, Jun Ren, Zhifeng Chen, Gang Nat Commun Article Doping is central for solid-state devices from transistors to thermoelectric energy converters. The interaction between electrons and dopants plays a pivotal role in carrier transport. Conventional theory suggests that the Coulomb field of the ionized dopants limits the charge mobility at high carrier densities, and that either the atomic details of the dopants are unimportant or the mobility can only be further degraded, while experimental results often show that dopant choice affects mobility. In practice, the selection of dopants is still mostly a trial-and-error process. Here we demonstrate, via first-principles simulation and comparison with experiments, that a large short-range perturbation created by selected dopants can in fact counteract the long-range Coulomb field, leading to electron transport that is nearly immune to the presence of dopants. Such “cloaking” of dopants leads to enhanced mobilities at high carrier concentrations close to the intrinsic electron–phonon scattering limit. We show that the ionic radius can be used to guide dopant selection in order to achieve such an electron-cloaking effect. Our finding provides guidance to the selection of dopants for solid-state conductors to achieve high mobility for electronic, photonic, and energy conversion applications. Nature Publishing Group UK 2022-05-06 /pmc/articles/PMC9076901/ /pubmed/35523766 http://dx.doi.org/10.1038/s41467-022-29958-2 Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Article
Zhou, Jiawei
Zhu, Hangtian
Song, Qichen
Ding, Zhiwei
Mao, Jun
Ren, Zhifeng
Chen, Gang
Mobility enhancement in heavily doped semiconductors via electron cloaking
title Mobility enhancement in heavily doped semiconductors via electron cloaking
title_full Mobility enhancement in heavily doped semiconductors via electron cloaking
title_fullStr Mobility enhancement in heavily doped semiconductors via electron cloaking
title_full_unstemmed Mobility enhancement in heavily doped semiconductors via electron cloaking
title_short Mobility enhancement in heavily doped semiconductors via electron cloaking
title_sort mobility enhancement in heavily doped semiconductors via electron cloaking
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9076901/
https://www.ncbi.nlm.nih.gov/pubmed/35523766
http://dx.doi.org/10.1038/s41467-022-29958-2
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