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Evolution of entrained water film thickness and dynamics of Marangoni flow in Marangoni drying
As an ultra-clean wafer drying technique, Marangoni drying has been widely applied in the integrated circuits manufacturing process. When the wafer is vertically withdrawn from a deionization water bath, Marangoni stress along the meniscus, which is induced by the organic vapour, strips off the wate...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2018
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9078033/ https://www.ncbi.nlm.nih.gov/pubmed/35539538 http://dx.doi.org/10.1039/c7ra13533e |