Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties

We report a new atomic layer deposition (ALD) process for yttrium oxide (Y(2)O(3)) thin films using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii) [Y(DPDMG)(3)] which possesses an optimal reactivity towards water that enabled the growth of high quality thin films. Saturative behavio...

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Detalles Bibliográficos
Autores principales: Mai, Lukas, Boysen, Nils, Subaşı, Ersoy, Arcos, Teresa de los, Rogalla, Detlef, Grundmeier, Guido, Bock, Claudia, Lu, Hong-Liang, Devi, Anjana
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2018
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9078035/
https://www.ncbi.nlm.nih.gov/pubmed/35539551
http://dx.doi.org/10.1039/c7ra13417g

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9078035/
https://www.ncbi.nlm.nih.gov/pubmed/35539551
http://dx.doi.org/10.1039/c7ra13417g

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