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Nanoindentation and deformation behaviors of silicon covered with amorphous SiO(2): a molecular dynamic study
A fundamental understanding of the mechanical properties and deformation behaviors of surface modified silicon during chemical mechanical polishing (CMP) processes is difficult to obtain at the nanometer scale. In this research, MD simulations of monocrystalline silicon covered with an amorphous SiO...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2018
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9079387/ https://www.ncbi.nlm.nih.gov/pubmed/35541277 http://dx.doi.org/10.1039/c7ra13638b |