Reaction control of metal-assisted chemical etching for silicon-based zone plate nanostructures

Metal-assisted chemical etching (MACE) reaction parameters were investigated for the fabrication of specially designed silicon-based X-ray zone plate nanostructures using a gold catalyst pattern and etching solutions composed of HF and H(2)O(2). Etching depth, zone verticality and zone roughness wer...

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Detalles Bibliográficos
Autores principales: Akan, Rabia, Parfeniukas, Karolis, Vogt, Carmen, Toprak, Muhammet S., Vogt, Ulrich
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2018
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9079411/
https://www.ncbi.nlm.nih.gov/pubmed/35541233
http://dx.doi.org/10.1039/c8ra01627e

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9079411/
https://www.ncbi.nlm.nih.gov/pubmed/35541233
http://dx.doi.org/10.1039/c8ra01627e

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